Deposition Rates in Thermal Laser Epitaxy: Simulation and Experiment
Journal:
arXiv
Published Date:
Jan 3, 2025
Abstract
The modeling of deposition rates in Thermal Laser Epitaxy (TLE) is essential
for the accurate prediction of the evaporation process and for improved dynamic
process control. We demonstrate excellent agreement between experimental data
and a model based on a finite element simulation that describes the temperature
distribution of an elemental source when irradiated with continuous wave laser
radiation. The simulation strongly depends on the thermophysical constants of
the material, data of which is lacking for many elements. Effective values for
the parameters may be determined with precision by means of an unambiguous
reference provided by the melting point of the material, which is directly
observed during the experiments. TLE may therefore be used to study the high
temperature thermophysical and optical properties of the elements.
