Reply to "How I learned to stop worrying and love machine learning" by Mattessich et al.

Journal: Clinics in dermatology
Published Date:

Abstract

No abstract available for this article.

Authors

  • Shawn Shih
    University of Central Florida College of Medicine, Orlando, Florida, USA.
  • Amor Khachemoune
    State University of New York Downstate, Department of Dermatology, Brooklyn, New York, USA. Electronic address: amorkh@gmail.com.