Photonic deep residual time-delay reservoir computing.

Journal: Neural networks : the official journal of the International Neural Network Society
PMID:

Abstract

Time-delay reservoir computing (TDRC) represents a simplified variant of recurrent neural networks, employing a nonlinear node with a feedback mechanism to construct virtual nodes. The capabilities of TDRC can be enhanced by transitioning to a deep architecture. In this work, we propose a novel photonic deep residual TDRC (DR-TDRC) with augmented capabilities. The additional time delay added to the residual structure enables DR-TDRC superior to traditional deep structures across various benchmark tasks, especially in memory capability and almost an order of magnitude improvement in nonlinear channel equalization. Additionally, a specifically designed clipping algorithm is utilized to counteract the damage of redundant layers in deep structures, enabling the extension of the deep TDRC to dozens rather than just a few layers, with higher performance. We experimentally demonstrate the proof-of-concept with a 4-layer DR-TDRC containing 960 interrelated neurons (240 neurons per layer), based on four injection-locked distributed feedback lasers. We confirm the potential for scalable deep RC with elevated performance. Our results provide a feasible approach for expanding deep photonic computing to satisfy the boosting demand for artificial intelligence.

Authors

  • Changdi Zhou
    School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China; Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China.
  • Yu Huang
    School of Data Science and Software Engineering, Qingdao University, Qingdao 266021, China.
  • Yigong Yang
    School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China; Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China.
  • Deyu Cai
    School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China; Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China.
  • Pei Zhou
    School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China; Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China. Electronic address: peizhou@suda.edu.cn.
  • Nianqiang Li
    School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China; Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China. Electronic address: nli@suda.edu.cn.