Robotic four-dimensional pixel assembly of van der Waals solids.

Journal: Nature nanotechnology
Published Date:

Abstract

Van der Waals (vdW) solids can be engineered with atomically precise vertical composition through the assembly of layered two-dimensional materials. However, the artisanal assembly of structures from micromechanically exfoliated flakes is not compatible with scalable and rapid manufacturing. Further engineering of vdW solids requires precisely designed and controlled composition over all three spatial dimensions and interlayer rotation. Here, we report a robotic four-dimensional pixel assembly method for manufacturing vdW solids with unprecedented speed, deliberate design, large area and angle control. We used the robotic assembly of prepatterned 'pixels' made from atomically thin two-dimensional components. Wafer-scale two-dimensional material films were grown, patterned through a clean, contact-free process and assembled using engineered adhesive stamps actuated by a high-vacuum robot. We fabricated vdW solids with up to 80 individual layers, consisting of 100 × 100 μm areas with predesigned patterned shapes, laterally/vertically programmed composition and controlled interlayer angle. This enabled efficient optical spectroscopic assays of the vdW solids, revealing new excitonic and absorbance layer dependencies in MoS. Furthermore, we fabricated twisted N-layer assemblies, where we observed atomic reconstruction of twisted four-layer WS at high interlayer twist angles of ≥4°. Our method enables the rapid manufacturing of atomically resolved quantum materials, which could help realize the full potential of vdW heterostructures as a platform for novel physics and advanced electronic technologies.

Authors

  • Andrew J Mannix
    James Franck Institute, University of Chicago, Chicago, IL, USA.
  • Andrew Ye
    Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.
  • Suk Hyun Sung
    Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
  • Ariana Ray
    School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.
  • Fauzia Mujid
    Department of Chemistry, University of Chicago, Chicago, IL, USA.
  • Chibeom Park
    Department of Chemistry, University of Chicago, Chicago, IL, USA.
  • Myungjae Lee
    JLK, Incorporated, Eonju-ro, Gangnam-gu, Seoul, South Korea.
  • Jong-Hoon Kang
    Department of Chemistry, University of Chicago, Chicago, IL, USA.
  • Robert Shreiner
    Department of Physics, University of Chicago, Chicago, IL, USA.
  • Alexander A High
    Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.
  • David A Muller
    School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA.
  • Robert Hovden
    Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
  • Jiwoong Park
    James Franck Institute, University of Chicago, Chicago, IL, USA. jwpark@uchicago.edu.